Overview
The AMAT/APPLIED MATERIALS 0010-59787 PECVD reactor is a deposition chamber designed for applying thin films or layers onto substrates used in various electronic devices and systems. Utilizing Plasma-Enhanced Chemical Vapor Deposition (PECVD), this reactor ensures excellent deposition uniformity and consistent layer thickness across the substrate surface. It features an automated load/unload chamber, integrated power, vacuum, and gas delivery modules, designed to minimize substrate handling time and reduce overall processing time. The chamber operates at higher temperatures compared to traditional thermal CVD processes, enabling the production of higher-quality films. With a user-friendly graphical interface and robust system architecture, the reactor offers an adjustable process window, allowing users to fine-tune temperature, pressure, and other parameters to meet specific deposition needs. The reactive gas delivery system employs low-pressure, low-temperature CVD (LP-CVD) techniques, enabling the selection and adjustment of reactive gases for highly specific film characteristics. The design ensures highly uniform film deposition and precise, repeatable film thickness profiles across the substrate. The system includes an intuitive controller with extensive data logging and process control capabilities, ensuring safe operation and reliable outcomes. The AMAT 0010-59787 PECVD reactor is a powerful deposition chamber, ideal for producing high-quality thin film materials for a wide range of electronic applications.Specifications
- ID: 293665751
- Wafer Size: 12 inches
- Description: Ceramic Heater for Producer, 12 inches
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| Shipping Port | ShangHai, Xiamen |
| Warranty | 12 Months |
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| A: All our new and original products come with a standard one-year warranty. |
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| A: Delivery usually takes 1-3 days after receiving the initial payment. For items with a lead time, shipping will occur according to the specified schedule. |
| Q: How Do We Package the Goods? |
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